Your Trusted Silica Quartz Supplier From India

Silica Quartz

Silica Quartz

Size of quartz supplied:

We supply all the above quartz in the form of

  • Lumps: ( 25 –300 mm)
  • Chips: ( 15 –40 mm )
  • Grit: Size as per customer requirement ( 0 to 15 mm)
  • Powder ( 100/200 Mesh)
  • Boulders: Big size (100 -300 mm)

Packing:
Standard packing is available in 50 kgs.

HDPE bags in 1.2 mt or 1.35 mts Jumbo bags with or without liner inside, or as per customer requirements.

Solar Panels / Solar Tubes Manufacturing

Silica quartz plays a crucial role in the manufacturing of solar panels and solar tubes. Its high purity and excellent optical properties make it an ideal material for producing photovoltaic cells, which convert sunlight into electricity. Silica quartz is used as a semiconductor material in the production of solar cells due to its ability to absorb and transmit sunlight efficiently, thereby enhancing the performance and durability of solar panels.

Elements Composition
Silicon Dioxide (SiO2): ≥ 99.5% - 99.99%
Alumina (Al2O3): ≤ 0.1%
Iron Oxide (Fe2O3): ≤ 0.05%
Titanium Dioxide (TiO2): ≤ 0.02%
Sodium Oxide (Na2O): ≤ 0.02%
Potassium Oxide (K2O): ≤ 0.02%
Magnesium Oxide (MgO): ≤ 0.02%
Calcium Oxide (CaO): ≤ 0.02%
Detailed Specifications
  • High purity silica quartz with minimal impurities to ensure optimal performance.
  •  Controlled particle size distribution for uniformity and consistency in solar cell manufacturing.
  • Exceptional optical transparency and light absorption properties.
  • Low thermal expansion coefficient to withstand temperature variations in solar panel applications.
  • Consistent electrical properties for efficient energy conversion.

Crucibles Manufacturing

Silica quartz is extensively used in the manufacturing of crucibles, which are essential containers for melting and processing metals and other materials at high temperatures. Its high melting point, thermal stability, and resistance to chemical corrosion make it an ideal material for crucible production across various industries, including metallurgy, ceramics, and semiconductor manufacturing.

Elements Composition
Silicon Dioxide (SiO2): ≥ 99.5% - 99.99%
Alumina (Al2O3): ≤ 0.2%
Iron Oxide (Fe2O3): ≤ 0.05%
Sodium Oxide (Na2O): ≤ 0.02%
Potassium Oxide (K2O): ≤ 0.02%
Magnesium Oxide (MgO): ≤ 0.02%
Calcium Oxide (CaO): ≤ 0.02%
Detailed Specifications
  • High purity silica quartz with minimal impurities to prevent contamination of molten materials.
  • High thermal shock resistance to withstand rapid temperature changes during metal melting processes.
  • Excellent chemical inertness to prevent reactions with molten metals and other substances.
  • Controlled porosity and density for optimal crucible performance and durability.
  • Consistent dimensional stability to maintain shape and integrity at high temperatures.

Semiconductor Manufacturing

Silica quartz plays a critical role in semiconductor manufacturing processes as a key component in the production of silicon wafers. Silicon wafers are used as substrates for fabricating integrated circuits and other semiconductor devices. The high purity and controlled crystal structure of silica quartz ensure the reliability and performance of semiconductor components in electronic devices.

Elements Composition
Silicon Dioxide (SiO2): ≥ 99.5% - 99.98%
Alumina (Al2O3): ≤ 0.1%
Iron Oxide (Fe2O3): ≤ 0.02%
Sodium Oxide (Na2O): ≤ 0.01%
Potassium Oxide (K2O): ≤ 0.01%
Boron Oxide (B2O3): ≤ 0.01%
Phosphorus Pentoxide (P2O5): ≤ 0.01%
Detailed Specifications
  • Ultra-high purity silica quartz with minimal impurities to meet stringent semiconductor manufacturing standards.
  • Consistent crystal structure and surface quality for uniformity and reliability in silicon wafer production.
  • Low levels of dopants and defects to ensure optimal electrical properties and device performance.
  • Precise dimensional control for wafer thickness and flatness requirements.
  • Excellent thermal conductivity and stability for efficient heat dissipation and device reliability.

Glass Industries

Silica quartz is a fundamental raw material in the glass industry, serving as the primary component in the production of various types of glass, including soda-lime glass, borosilicate glass, and fused silica glass. Its high purity, clarity, and thermal stability make it indispensable for manufacturing glass products used in construction, automotive, packaging, and consumer electronics.

Elements Composition
Silicon Dioxide (SiO2): ≥ 99.5% - 99.98%
Alumina (Al2O3): ≤ 0.15%
Iron Oxide (Fe2O3): ≤ 0.05%
Sodium Oxide (Na2O): ≤ 0.02%
Potassium Oxide (K2O): ≤ 0.02%
Calcium Oxide (CaO): ≤ 0.02%
Magnesium Oxide (MgO): ≤ 0.02%
Detailed Specifications
  • High purity silica quartz with minimal impurities to ensure optical clarity and chemical stability in glass production.
  • Controlled particle size distribution for consistent glass composition and properties.
  • Exceptional thermal shock resistance to withstand rapid temperature changes during glass forming processes.
  • Low coefficient of expansion to prevent glass distortion and breakage.
  • Tailored formulations for specific glass types and applications, such as clear glass, colored glass, and specialty glass products.

Optical Fiber Industries

Silica quartz is a fundamental raw material in the glass industry, serving as the primary component in the production of various types of glass, including soda-lime glass, borosilicate glass, and fused silica glass. Its high purity, clarity, and thermal stability make it indispensable for manufacturing glass products used in construction, automotive, packaging, and consumer electronics.

Elements Composition
Silicon Dioxide (SiO2): ≥ 99.5% - 99.98%
Alumina (Al2O3): ≤ 0.1%
Iron Oxide (Fe2O3): ≤ 0.02%
Sodium Oxide (Na2O): ≤ 0.02%
Potassium Oxide (K2O): ≤ 0.02%
Boron Oxide (B2O3): ≤ 0.02%
Phosphorus Pentoxide (P2O5): ≤ 0.02%
Detailed Specifications
  • High purity silica quartz with minimal impurities to ensure optical clarity and chemical stability in glass production.
  • Controlled particle size distribution for consistent glass composition and properties.
  • Exceptional thermal shock resistance to withstand rapid temperature changes during glass forming processes.
  • Low coefficient of expansion to prevent glass distortion and breakage.
  • Tailored formulations for specific glass types and applications, such as clear glass, colored glass, and specialty glass products.

Specification